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Following is a list of all major equipment in use at MMDL. The equipment is arranged in categories. You may narrow the list by using the Selection tool. We also provide a Search tool to assist you in finding particular equipment. People who are new to the area of Semiconductor growth should review the information provided on the History and Facilities pages.
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Characterization Equipment
AFM
CAFM
Deep Level Transient Spectrometer
E-Beam Lithography
Hall Measurements
I-V & C-V
Low Frequency Noise and Phase Noise Setup
Magnetotransport and magnetooptical measurement system
Microwave Parameterization
MPMS
Near-Field Scanning Optical Microscopy
Photoluminescence
Pulsed Electroluminescent measurements
Scanning Electron Microscope
Surface Profilometer
X-ray Diffraction
Deposition Equipment
HVPE
LPE
MBE 1000
MOCVD
Riber 32
Riber 3200
Sputtering
SVT MBE - GaN
SVT MBE - ZnO
UHVCVD
Fabrication Equipment
Dry Etcher
Evaporator
Inductively Coupled Plasma Etching System
Mask Aligner
Nano-imprinter Lithography
Reactive Ion Etching System
Spin Coater/Hot Plate
Sputter Coater
Support Equipment
Box Furnace 1
Box Furnace 2
Dicing / Cutting Saw
Hydrogen Polishing Station
Outgassing Chamber
Packaging
Polisher
Rapid Thermal Annealing
Tube Furnace
Wet Bench
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